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Growth mode transition from layer-by-layer to step-flow during the growth of heteroepitaxial SrRu)3 on (001) SrTiO3

机译:在(001)SrTiO3上异质外延SrRu)3的生长过程中,生长模式从逐层过渡到逐步流动

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摘要

We have observed the growth mode transition from two-dimensional (2D) layer-by-layer to step-flow in the earliest stage growth of heteroepitaxial SrRuO3 thin films on TiO2-terminated (001) SrTiO3 substrates by in situ high pressure reflective high energy electron diffraction (RHEED) and atomic-force microscopy. There is no RHEED intensity recovery after each laser pulse in the first oscillation when the growth mode is 2D layer-by-layer. On the other hand, it is getting more pronounced in the second oscillation, and finally reaches a dynamic steady state in which the growth mode is completely changed into the step-flow mode. The origin of the growth mode transition can be attributed to a change in the mobility of adatoms and switching the surface termination layer from the substrate to the film. SrRuO3 thin films with an atomically smooth surface grown by atomic layer control can be used in oxide multilayered heterostructure devices.
机译:我们已经观察到,在原位高压反射高能作用下,在TiO2端基(001)SrTiO3衬底上异质外延SrRuO3薄膜的最早生长过程中,生长模式从二维(2D)逐层过渡到逐步流动。电子衍射(RHEED)和原子力显微镜。当生长模式是逐层2D时,在第一次振荡中的每个激光脉冲之后,都没有RHEED强度恢复。另一方面,它在第二次振荡中变得更加明显,并最终达到动态稳态,在该稳态下,生长模式完全变为步进流模式。生长模式转变的起源可以归因于原子迁移率的改变以及表面终止层从基底到薄膜的转变。通过原子层控制生长的具有原子光滑表面的SrRuO3薄膜可用于氧化物多层异质结构器件中。

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